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Laboratory coater for layer deposition (3D substrates) by means of pulse magnetron sputtering UNIVERSA

Basic Information

Name: Laboratory coater for layer deposition (3D substrates) by means of pulse magnetron sputtering
Model: UNIVERSA
Partner: Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology (FEP)

Short Description

Laboratory coater for layer deposition (3D substrates) by means of pulse magnetron sputtering.

Description

Batch plant for coating 3-D substrates

Very versatile production-scale plant equipped with:

  • two dual magnetron systems with 50 kW pulsed voltage supplies
  • a hollow cathode source for additional plasma generation
  • a pulsed voltage source for plasma pre-treatment/treatment
  • a unit for heating the substrate up to 700°C
  • 1-, 2- or 3-fold substrate rotation
  • devices for process control, data recording and plasma diagnostics

 

Typical substrate

  • coating of substrates having 3-D geometries with typical dimensions of
    10 × 10 × 10 mm3 up to a maximum of 500 × 500 × 500 mm3

 

Range of applications

  • development of layers, technology and processes
  • feasibility studies
  • preparation of sample coatings
  • small series coating
  • testing technological components

Link to Further Details

https://www.fep.fraunhofer.de/de/Leistungsangebot/Anlagentechnik/universa.html

Options of instrument usage

Points of Contact

Ines Schedwill
Email:
Phone:
+49 351 8823-238
Fax:
+49 351 8823-394

Images

Last Update

Last updated at: 14 November 2018 at 15:06:47